E+H Wafer Characterization Tools For Backside Grinding
  • MX 203-6-33-B
    Manually loaded warp and thickness gauge
    100 mm, 125 mm and 150 mm wafers

  • MX 203-8-37-B
    Manually loaded warp and thickness gauge
    150 mm and 200 mm wafers


  • MX 203-8-49-B
    Manually loaded warp and thickness gauge
    100 mm, 125 mm, 150 mm and 200 mm wafers

  • MX 202-1-G-1
    Cassette-to-cassette warp and thickness gauge Transport belts, one input module, one output module. 100 mm and 150 mm wafers

  • MX 202-2-G8-1
    Go/no go warp and thickness sorter. Transport belts, one input module, two output modules
    150 mm and 200 mm wafers


  • MX 203-58-37-B
    Manually loaded warp and thickness gauge
    125 mm, 150 mm and 200 mm wafers


  • MX 204-8-21-VR
    Automatic warp and thickness gauge. Robot, motor-driven wafer tray, vacuum chuck.
    150 mm and 200 mm wafers


  • MX 2013-37-R; MX 2013-37
    Automatic or manual load warp and thickness gauge. Robot, vacuum chuck, motor-driven wafer tray. 200 and 300 mm wafers

  • MX 202-1-GW-1
    Cassette-to-cassette warp and thickness gauge. Separate thickness and warp probe heads, vacuum chuck. Transport belts, one input module, one output module. 150 mm wafers

  • MX 204-6-13-V
    Manually loaded warp and thickness gauge. Motor-driven wafer tray, vacuum chuck.
    100 mm, 125 mm and 150 mm wafers


  • MX 204-8-21-V
    Manually loaded warp and thickness gauge. Motor-driven wafer tray, vacuum chuck.
    150 mm and 200 mm wafers

 

.

Maximum warp allowed: 700 µm
Maximum warp allowed: 800 µm
Maximum warp allowed: 1000 µm
Maximum warp allowed: 1100 µm
Maximum warp allowed: 1600 µm
Maximum warp allowed: 1600 µm
Maximum warp allowed: 2000 µm
Maximum warp allowed: 6000 µm
Maximum warp allowed: 2500 µm
Maximum warp allowed: 3000 µm
Maximum warp allowed: 3000 µm
Note: Specifcation of maximum warp allowed refers to largest wafer diameter

 

Downloadable product information:

 

E+H also offers a unique line of wafer gauges for 300mm wafer characterization as well as several standard wafer characterization tools.

Back