MX 601
	Contactless Resistivity Gauge for GaAs Wafers
	Features
	Measurement of the specific resistance of GaAs Wafers Non-contact, capacitive measuring method Independent of wafer thickness No recalibration required PC-controlled via serial interface
	Description
	The MX 601 measures the specific resistance of gallium arsenide semiconductor wafers. For the measurement, the wafer is placed on the vacuum table and the cover is closed to keep out light. The vacuum is generated via a converter so that only a regular compressed air supply is required. A PC evaluates the data and then calculates and outputs the results. Using a computer has the added advantage that the calibration constants can be accessed, the output type can be changed, and statistical programs can be added.
	Measuring Principle
	If a capacitor is constructed such that the semiconductor material to be measured constitutes its dielectric material, the specific resistance can be determined if the dielectric constant is known, by measuring the cut-off frequency.
This theory is based on the formal analogy between the displacement flow of the electrical field and the current in the current field.
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