| Magic
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| Bibliography |
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- Characterization
of Mirror-Polished Silicon Wafers by Makyoh Method; S. Tokura,
M. Ninomiya, K. Masuda; Journal of Crystal Growth 103 (1990) 437-442
- About
One Cause of Silicon Wafer Surface Defects,
K. Vojtechovsky, M. Sifalda; Tesla Roznov, Czechoslovakia, 12p.
- Evaluation
of Directly Bonded Silicon Wafer Interface by The Magic Mirror
Method; O. Okabayashi, H. Shirotori, H. Sakurazawa, E. Kanda,
T. Yokoyama, M. Kawashima; Journal of Crystal Growth 103 (1990)
456-460
- Characterization
Tools for Rapid Thermal Processing Systems (Part 2); C.B.
Yarling, W.A. Keenan; Microelectronics Manufacturing and Testing-Publication
1989 23-24
- Realtime
Inspection of Wafer Surfaces; P. Blaustein, S. Hahn; Solid
State Technology-Publication 1990 3p.
- Characterization
of Polished Mirror Surfaces by the "Makyoh" Principle;
K. Kugimiya; Materials Letters Volume 7, number 5.6 (1988) 229-233
- Characterization
of Mirror-Polished SI Wafers and Advanced SI Substrate Structures
Using the Magic Mirror Method; S. Hahn, K. Kugimiya, K. Vojtechovsky,
M. Sifalda, M. Yamashita, P.R. Blaustein, K. Takahashi; Semiconductor
Science Technology 7 (1992) A80-A85
- Defect
Analysis of Rapid Thermal Processing Round Robin Results;
C.B. Yarling, W. Andrew Keenan; A symposium 1989 Spring Meeting
of the Materials Research Society 10p.
- Characterization
of Mirror-Like Wafer Surfaces Using the Magic Mirror method;
S. Hahn, K. Kugimiya, M. Yamashita, P.R. Blaustein, K. Takahashi;
Journal of Crystal Growth 103 (1990) 423-432
- Characterization
of Deformations and Texture Defects on Polished Wafers of III-V
Compound Crystals by the Magic Mirror Method; C-C Shiue, K-H
Lie, P.R. Blaustein; Semiconductor Science Technology 7 (1992)
A95-97
- Full-Field
Submicron Visual Wafer Inspection; P.R. Blaustein, R. Wise,
R. Kahn; Microelectronics Manufacturing Technology-Publication
1991 3p.
- Makyoh
Topography: Comparison with X-Ray Topography; K. Kugimiya;
Semiconductor Science Technology 7 (1992) A91-94
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