Magic Mirror™
300MM Manual Wafer Surface Inspection System
YIS-300SP Standard Features
  • Manual loading, rotating wafer chuck
  • 150 - 300mm wafer sizes
  • Full wafer view and 4x zoom for close-up (slip line) inspection
  • Adjustable sensitivity setting with digital display
  • Adjustable intensity (brightness) setting with digital display for wafer reflectivity
Optical Resolution
  • Monochrome 800 x 600 low-light level CCD. Detection sensitivity: <0.05 micron depth, <1M-100M radius of curvature.
  • <0.05 micron depth, <1 M - 100M radius of curvature.
Light Source & Optics
  • Broad-Beam illumination with narrow band-pass filtered white lamp.
  • Photo-diode sensor and feedback circuit for continuous intensity output.
  • Defocused reflective imaging using the proprietary Magic Mirror™ method.
Software
  • Semi-automated image enhancement and analysis program with 25 function processor.
  • Option - High resolution printer w/255 grey shades or color 8" x 10" thermal video prints.
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